Bin Bin Yan

Holistic metrology approach: hybrid metrology utilizing scatterometry, critical dimension-atomic force microscope and critical dimension-scanning electron microscope

Peter Ebersbach, Charles N. Archie, Alok Vaid, 2011 .

A holistic metrology approach: hybrid metrology utilizing scatterometry, CD-AFM, and CD-SEM

Peter Ebersbach, Alok Vaid, Cornel Bozdog, 2011, Advanced Lithography.