Tokio Nishita

The novel solution for negative impact of out-of-band and outgassing by top coat materials in EUVL

Noriaki Fujitani, Ryuji Onishi, Rikimaru Sakamoto, 2013, Advanced Lithography.

Novel pattern trimming and shrink material (PTM (PTD) and PSM (NTI)) for ArF/EUV extension

Rikimaru Sakamoto, Tokio Nishita, 2016, SPIE Advanced Lithography.