Thomas Verduin

发表

Simulation of shotnoise induced side-wall roughness in electron lithography

C. W. Hagen, Thomas Verduin, S. R. Lokhorst, 2016, SPIE Advanced Lithography.

Size and shape control of sub-20 nm patterns fabricated using focused electron beam-induced processing

Cornelis W. Hagen, C. W. Hagen, Thomas Verduin, 2014 .

The effect of sidewall roughness on line edge roughness in top-down scanning electron microscopy images

Pieter Kruit, C. W. Hagen, Thomas Verduin, 2015, Advanced Lithography.

GPU accelerated Monte-Carlo simulation of SEM images for metrology

C. W. Hagen, Thomas Verduin, S. R. Lokhorst, 2016, SPIE Advanced Lithography.

Determination of line edge roughness in low dose top-down scanning electron microscopy images

Pieter Kruit, Cornelis W. Hagen, Thomas Verduin, 2014, Advanced Lithography.

Deflection properties of an electrostatic electron lens with a shifted electrode

Cornelis W. Hagen, C. W. Hagen, Thomas Verduin, 2013 .

Determination of line edge roughness in low-dose top-down scanning electron microscopy images

Cornelis W. Hagen, C. W. Hagen, Thomas Verduin, 2014 .