Douglas Mckenzie

PEB sensitivity studies of ArF resists: II. Polymer and solvent effects

Sang-Ho Lee, Munirathna Padmanaban, Ralph R. Dammel, 2004, SPIE Advanced Lithography.

Development of Spin-on High Carbon Hard Masks for High Resolution Photolithography

Guanyang Lin, Douglas Mckenzie, M. Dalil Rahman, 2011 .

Spin-on Trilayer Approaches to High NA 193nm Lithography

Hengpeng Wu, Ralph R. Dammel, Woo-Kyu Kim, 2007 .

Functional Properties of Novel Metallic Hard Masks

Alberto D. Dioses, Huirong Yao, Elizabeth Wolfer, 2013 .

Progress in Spin-on Hard Mask Materials for Advanced Lithography

Yi Cao, Munirathna Padmanaban, Takanori Kudo, 2014 .