Hans Jasper

Optical lithography solutions for sub-65-nm semiconductor devices

Jan Mulkens, James A. McClay, Bruce A. Tirri, 2003, SPIE Advanced Lithography.

0.35-μm lithography using off-axis illumination

Linard Karklin, Peter van Oorschot, Paul F. Luehrmann, 1993, Advanced Lithography.

Step-and-scan and step-and-repeat: a technology comparison

Steve D. Slonaker, Martin A. van den Brink, Hans Jasper, 1996, Advanced Lithography.

Performance and characteristics of the NXE:3400 optical system enabling sub-10nm node lithography (Conference Presentation)

Tilmann Heil, Peter Kürz, Erik Roelof Loopstra, 2017 .