Helen Zhu

30nm half-pitch metal patterning using Moti CD shrink technique and double patterning

Vincent Wiaux, Mireille Maenhoudt, Johan Vertommen, 2008, SPIE Advanced Lithography.

A novel plasma-assisted shrink process to enlarge process windows of narrow trenches and contacts for 45-nm node applications and beyond

Reza Sadjadi, Jisoo Kim, Werner Boullart, 2007, SPIE Advanced Lithography.

Utilization of microbial iron assimilation processes for the development of new antibiotics and inspiration for the design of new anticancer agents

Li Dong, Helen Zhu, S. Franzblau, 2009, BioMetals.