Akihiro Sonoda

The defect mitigation on EUV stack by track based technology

Nelson Felix, Cody Murray, Karen Petrillo, 2019, Advanced Lithography.

Improvement of CD stability and defectivity in resist coating and developing process in EUV lithography process

Philippe Foubert, Kathleen Nafus, Shinichiro Kawakami, 2018, Photomask Technology.

Novel technologies in coater/developer to enhance the CD stability and to improve the defectivity toward N7 and smaller nodes

Makoto Muramatsu, Philippe Foubert, Kathleen Nafus, 2019, Advanced Lithography.