Munirathna Padmanaban

发表

E-beam curing effects on the etch and CD-SEM stability of 193-nm resists

Sang-Ho Lee, Munirathna Padmanaban, Eric L. Alemy, 2002, SPIE Advanced Lithography.

Development of spin-on-carbon hard mask for advanced node

Munirathna Padmanaban, Takanori Kudo, M. Dalil Rahman, 2014, Advanced Lithography.

Study of the effect of amine additives on LWR and LER

Munirathna Padmanaban, Ralph R. Dammel, Takanori Kudo, 2006, SPIE Advanced Lithography.

Cycloolefin/maleic anhydride copolymers for 193-nm resist compositions

Munirathna Padmanaban, Ralph R. Dammel, M. D. Rahman, 1999, Advanced Lithography.

Application of photodecomposable base concept to 193-nm resists

Jeff D. Byers, Munirathna Padmanaban, Ralph R. Dammel, 2000, Advanced Lithography.

Lithographic performance of a dry-etch stable methacrylate resist at 193 nm

Munirathna Padmanaban, Ralph R. Dammel, Stanley A. Ficner, 1998, Advanced Lithography.

Bottom antireflective coatings for ArF, KrF, and i-line applications: a comparison of theory, design, and lithographic aspects

Shuji Ding, Munirathna Padmanaban, Ralph R. Dammel, 1999, Advanced Lithography.

Structure-property relationship in acetal-based chemically amplified three-component DUV resist

Thomas J. Lynch, Munirathna Padmanaban, Takanori Kudo, 1994, Advanced Lithography.

PEB sensitivity studies of ArF resist

Munirathna Padmanaban, Woo-Kyu Kim, Takanori Kudo, 2003, SPIE Advanced Lithography.

Some non-resist component contributions to LER and LWR in 193-nm lithography

Munirathna Padmanaban, Ralph R. Dammel, Takanori Kudo, 2007, SPIE Advanced Lithography.

Effect of the rinse solution to avoid 193-nm resist line collapse: a study for modification of resist polymer and process conditions

Munirathna Padmanaban, Ralph R. Dammel, Woo-Kyu Kim, 2004, SPIE Advanced Lithography.

Process optimization consideration for 193nm developable bottom anti-reflective coatings (DBARCs)

Edward Ng, Mark Neisser, Munirathna Padmanaban, 2010, Advanced Lithography.

Delay-time effects between exposure and post-exposure bake in acetal-based deep-UV photoresists

Munirathna Padmanaban, Georg Pawlowski, Yoshiaki Kinoshita, 1993, Advanced Lithography.

Illumination, acid diffusion, and process optimization considerations for 193-nm contact hole resists

Sang-Ho Lee, Munirathna Padmanaban, Woo-Kyu Kim, 2002, SPIE Advanced Lithography.

Effect of humidity, residual solvent, and adventitious clean-room contaminants on the performance of AZ-PN

Munirathna Padmanaban, Takanori Kudo, Yasuhiro Nakajima, 1992, Advanced Lithography.

Application of photodecomposable base concept to two-component deep-UV chemically amplified resists

Munirathna Padmanaban, Georg Pawlowski, Yoshiaki Kinoshita, 1996, Advanced Lithography.

Delay-time stable chemically amplified deep-UV resist

Munirathna Padmanaban, Takanori Kudo, Georg Pawlowski, 1993, Advanced Lithography.

Spin-on metal oxide materials with high etch selectivity and wet strippability

Munirathna Padmanaban, Douglas McKenzie, Huirong Yao, 2016, SPIE Advanced Lithography.

Effect of hard bake process on LER

Munirathna Padmanaban, Dalil Rahman, David Rentkiewicz, 2005, SPIE Advanced Lithography.

PEB sensitivity studies of ArF resists: II. Polymer and solvent effects

Sang-Ho Lee, Munirathna Padmanaban, Ralph R. Dammel, 2004, SPIE Advanced Lithography.

A chemical underlayer approach to mitigate shot noise in EUV contact hole patterning

Yi Cao, Munirathna Padmanaban, Takanori Kudo, 2014, Advanced Lithography.

Versatility in lithographic performance of advanced 193 nm contact hole resist

John J. Biafore, Munirathna Padmanaban, Ralph R. Dammel, 2006, SPIE Advanced Lithography.

Planarization of topography with spin-on carbon hard mask

Munirathna Padmanaban, Takanori Kudo, Maki Ishii, 2016, SPIE Advanced Lithography.

Performance of a dry 193nm resist under wet conditions

Munirathna Padmanaban, Ralph R. Dammel, Dalil Rahman, 2006, SPIE Advanced Lithography.

Radiation sensitive developable bottom anti-reflective coatings (DBARC): recent results

Lin Zhang, Edward Ng, Mark Neisser, 2009, Advanced Lithography.

Progress in spin-on metal oxide hardmask materials for filling applications

Yi Cao, Munirathna Padmanaban, Douglas McKenzie, 2015, Advanced Lithography.

Acetal-based three-component CARs: a versatile concept to tailor optical properties of resists

Hiroshi Okazaki, Munirathna Padmanaban, Georg Pawlowski, 1996, Advanced Lithography.

Underlayer and rinse materials for improving EUV resist performance

Munirathna Padmanaban, Takanori Kudo, Jin Li, 2013, Advanced Lithography.

Novel diamantane polymer platform for enhanced etch resistance

Munirathna Padmanaban, Ralph R. Dammel, Takanori Kudo, 2007, SPIE Advanced Lithography.

High-performance 193-nm resist composition using hybrid copolymers of cycloolefin/maleic anhydride (COMA)/methacrylate

Sang-Ho Lee, Munirathna Padmanaban, Eric L. Alemy, 2002, SPIE Advanced Lithography.

Cycloolefin-maleic anhydride copolymers for 193-nm resist compositions

Munirathna Padmanaban, Ralph R. Dammel, Woo-Kyu Kim, 1999, Advanced Lithography.

Novel spin-on metal hardmask materials for filling applications

Edward Ng, Munirathna Padmanaban, Alberto D. Dioses, 2014, Advanced Lithography.

Comparison of thermal flow and chemical shrink processes for 193 nm contact hole patterning

Yi Cao, Munirathna Padmanaban, Takanori Kudo, 2009, Advanced Lithography.

CD changes of 193-nm resists during SEM measurement

Munirathna Padmanaban, Ralph R. Dammel, Woo-Kyu Kim, 2001, SPIE Advanced Lithography.

Advanced RELACS (resolution enhancment of lithography by assist of chemical shrink) material for 193-nm lithography

Sang-Gyun Woo, Yusuke Takano, Munirathna Padmanaban, 2003, SPIE Advanced Lithography.

Latest developments in photosensitive developable bottom anti-reflective coating (DBARC)

Edward Ng, Mark Neisser, Munirathna Padmanaban, 2009, Lithography Asia.

A phase segregating polymer blend for 2xnm feature applications

Munirathna Padmanaban, Jin Li, Tatsuro Nagahara, 2012, Advanced Lithography.

Novel hybrid copolymers of cycloolefin/maleic anhydride (COMA)/methacrylate for 193-nm resist compositions

Munirathna Padmanaban, Woo-Kyu Kim, Takanori Kudo, 2001, SPIE Advanced Lithography.

193 nm resist composition using hybrid copolymers of cycloolefin/maleic anhydride (COMA)/methacrylate

Munirathna Padmanaban, Takanori Kudo, M. Dalil Rahman, 2006, SPIE Advanced Lithography.

New spin-on metal hardmask materials for lithography processes

Munirathna Padmanaban, Dalil Rahman, Clement Anyadiegwu, 2013, Advanced Lithography.

Performance of imide and methide onium PAGs in 193-nm resist formulations

Munirathna Padmanaban, Woo-Kyu Kim, Takanori Kudo, 2003, SPIE Advanced Lithography.

Evaluation results for the positive deep-UV resist AZ DX 46

Munirathna Padmanaban, Takanori Kudo, Francoise Vinet, 1994, Advanced Lithography.

Chemical shrink materials and process for negative tone development (NTD) resist

Munirathna Padmanaban, Georg Pawlowski, Yoshihiro Miyamoto, 2014, Advanced Lithography.

Chemical and lithographic aspects of organic deep-UV BARCs

Munirathna Padmanaban, Hatsuyuki Tanaka, Georg Pawlowski, 1998, Advanced Lithography.

Performance of 193-nm resists based on alicyclic methacrylate and cyclo-olefin systems

Munirathna Padmanaban, Ralph R. Dammel, Michelle M. Cook, 1999, Other Conferences.

Thermal phenomena in acrylic 193-nm resists

Munirathna Padmanaban, Ralph R. Dammel, Charles Rosilio, 1999, Advanced Lithography.

PHOTODECOMPOSABLE BASES: A NOVEL CONCEPT TO STABILIZE CHEMICALLY AMPLIFIED RESISTS

Munirathna Padmanaban, Takanori Kudo, Georg Pawlowski, 1995 .

Mechanistic Studies on the CD Degradation of 193nm Resists during SEM Inspection.

Munirathna Padmanaban, Eric L. Alemy, Ralph R. Dammel, 2001 .

Progress in Spin-on Hard Mask Materials for Advanced Lithography

Yi Cao, Munirathna Padmanaban, Takanori Kudo, 2014 .