Takanori Kudo

发表

E-beam curing effects on the etch and CD-SEM stability of 193-nm resists

Sang-Ho Lee, Munirathna Padmanaban, Eric L. Alemy, 2002, SPIE Advanced Lithography.

Development of spin-on-carbon hard mask for advanced node

Munirathna Padmanaban, Takanori Kudo, M. Dalil Rahman, 2014, Advanced Lithography.

Study of the effect of amine additives on LWR and LER

Munirathna Padmanaban, Ralph R. Dammel, Takanori Kudo, 2006, SPIE Advanced Lithography.

Application of photodecomposable base concept to 193-nm resists

Jeff D. Byers, Munirathna Padmanaban, Ralph R. Dammel, 2000, Advanced Lithography.

Structure-property relationship in acetal-based chemically amplified three-component DUV resist

Thomas J. Lynch, Munirathna Padmanaban, Takanori Kudo, 1994, Advanced Lithography.

PEB sensitivity studies of ArF resist

Munirathna Padmanaban, Woo-Kyu Kim, Takanori Kudo, 2003, SPIE Advanced Lithography.

Some non-resist component contributions to LER and LWR in 193-nm lithography

Munirathna Padmanaban, Ralph R. Dammel, Takanori Kudo, 2007, SPIE Advanced Lithography.

Process optimization consideration for 193nm developable bottom anti-reflective coatings (DBARCs)

Edward Ng, Mark Neisser, Munirathna Padmanaban, 2010, Advanced Lithography.

Illumination, acid diffusion, and process optimization considerations for 193-nm contact hole resists

Sang-Ho Lee, Munirathna Padmanaban, Woo-Kyu Kim, 2002, SPIE Advanced Lithography.

Effect of humidity, residual solvent, and adventitious clean-room contaminants on the performance of AZ-PN

Munirathna Padmanaban, Takanori Kudo, Yasuhiro Nakajima, 1992, Advanced Lithography.

Delay-time stable chemically amplified deep-UV resist

Munirathna Padmanaban, Takanori Kudo, Georg Pawlowski, 1993, Advanced Lithography.

PEB sensitivity studies of ArF resists: II. Polymer and solvent effects

Sang-Ho Lee, Munirathna Padmanaban, Ralph R. Dammel, 2004, SPIE Advanced Lithography.

A chemical underlayer approach to mitigate shot noise in EUV contact hole patterning

Yi Cao, Munirathna Padmanaban, Takanori Kudo, 2014, Advanced Lithography.

Material design and lithographic performance of novel hydroxystyrene-copolymer-based DUV negative resists

Takanori Kudo, Georg Pawlowski, Seiya Masuda, 1998, Advanced Lithography.

Versatility in lithographic performance of advanced 193 nm contact hole resist

John J. Biafore, Munirathna Padmanaban, Ralph R. Dammel, 2006, SPIE Advanced Lithography.

Planarization of topography with spin-on carbon hard mask

Munirathna Padmanaban, Takanori Kudo, Maki Ishii, 2016, SPIE Advanced Lithography.

Method and device for controlling the operation of a heat pump device

Takanori Kudo, Hisashi Nakajima, Noriyuki Arata, 2010 .

Radiation sensitive developable bottom anti-reflective coatings (DBARC): recent results

Lin Zhang, Edward Ng, Mark Neisser, 2009, Advanced Lithography.

Underlayer and rinse materials for improving EUV resist performance

Munirathna Padmanaban, Takanori Kudo, Jin Li, 2013, Advanced Lithography.

Novel diamantane polymer platform for enhanced etch resistance

Munirathna Padmanaban, Ralph R. Dammel, Takanori Kudo, 2007, SPIE Advanced Lithography.

High-performance 193-nm resist composition using hybrid copolymers of cycloolefin/maleic anhydride (COMA)/methacrylate

Sang-Ho Lee, Munirathna Padmanaban, Eric L. Alemy, 2002, SPIE Advanced Lithography.

Cycloolefin-maleic anhydride copolymers for 193-nm resist compositions

Munirathna Padmanaban, Ralph R. Dammel, Woo-Kyu Kim, 1999, Advanced Lithography.

Comparison of thermal flow and chemical shrink processes for 193 nm contact hole patterning

Yi Cao, Munirathna Padmanaban, Takanori Kudo, 2009, Advanced Lithography.

CD changes of 193-nm resists during SEM measurement

Munirathna Padmanaban, Ralph R. Dammel, Woo-Kyu Kim, 2001, SPIE Advanced Lithography.

Advanced RELACS (resolution enhancment of lithography by assist of chemical shrink) material for 193-nm lithography

Sang-Gyun Woo, Yusuke Takano, Munirathna Padmanaban, 2003, SPIE Advanced Lithography.

Latest developments in photosensitive developable bottom anti-reflective coating (DBARC)

Edward Ng, Mark Neisser, Munirathna Padmanaban, 2009, Lithography Asia.

Novel hybrid copolymers of cycloolefin/maleic anhydride (COMA)/methacrylate for 193-nm resist compositions

Munirathna Padmanaban, Woo-Kyu Kim, Takanori Kudo, 2001, SPIE Advanced Lithography.

193 nm resist composition using hybrid copolymers of cycloolefin/maleic anhydride (COMA)/methacrylate

Munirathna Padmanaban, Takanori Kudo, M. Dalil Rahman, 2006, SPIE Advanced Lithography.

Performance of imide and methide onium PAGs in 193-nm resist formulations

Munirathna Padmanaban, Woo-Kyu Kim, Takanori Kudo, 2003, SPIE Advanced Lithography.

Cycloolefin/cyanoacrylate (COCA) copolymers for 193-nm and 157-nm lithography

Sang-Ho Lee, Ralph R. Dammel, Takanori Kudo, 2002, SPIE Advanced Lithography.

Evaluation results for the positive deep-UV resist AZ DX 46

Munirathna Padmanaban, Takanori Kudo, Francoise Vinet, 1994, Advanced Lithography.

PHOTODECOMPOSABLE BASES: A NOVEL CONCEPT TO STABILIZE CHEMICALLY AMPLIFIED RESISTS

Munirathna Padmanaban, Takanori Kudo, Georg Pawlowski, 1995 .

PIGMENTED PHOTORESISTS FOR COLOR FILTERS

Takanori Kudo, Georg Pawlowski, Kazuya Nagao, 1996 .

Polymer Optimization of Pigmented Photoresists for Color Filter Production

Takanori Kudo, Georg Pawlowski, Yuko Nozaki, 1998 .

Fabrication Process of Color Filters Using Pigmented Photoresists

Takanori Kudo, Georg Pawlowski, Wen-Bing Kang, 1998 .

Mechanistic Studies on the CD Degradation of 193nm Resists during SEM Inspection.

Munirathna Padmanaban, Eric L. Alemy, Ralph R. Dammel, 2001 .

Progress in Spin-on Hard Mask Materials for Advanced Lithography

Yi Cao, Munirathna Padmanaban, Takanori Kudo, 2014 .

New Resin Systems for 157nm Lithography

Will Conley, Ralph R. Dammel, Takanori Kudo, 2001 .

Pigmented Photoresist for Black Matrix.

Takanori Kudo, Georg Pawlowski, Kazuya Nagao, 1996 .