Dongbo Xu

发表

Reducing EUV mask 3D effects by alternative metal absorbers

Vicky Philipsen, Eric Hendrickx, Frank Scholze, 2017, Advanced Lithography.

High-order aberration measurement technique based on a quadratic Zernike model with optimized source

Sikun Li, Anatoly Bourov, Andreas Erdmann, 2013 .

Extended AMAI-PCA technique based on multi-level Box–Behnken design

Sikun Li, Anatoly Bourov, Xiangzhao Wang, 2013 .

Plant Image Analysis Machine Vision System in Greenhouse

Hao Liu, Shuting Wang, Jianshu Chen, 2014, CCTA.

In situ aberration measurement technique based on quadratic Zernike model

Sikun Li, Anatoly Bourov, Andreas Erdmann, 2012, Optical Systems Design.

In situ aberration measurement technique based on an aerial image with an optimized source

Sikun Li, Anatoly Bourov, Andreas Erdmann, 2013 .

Defect parameters retrieval based on optical projection images

Sikun Li, Andreas Erdmann, Xiangzhao Wang, 2013, Optical Metrology.

Reducing extreme ultraviolet mask three-dimensional effects by alternative metal absorbers

Vicky Philipsen, Eric Hendrickx, Frank Scholze, 2017 .

Concurrent design rule, OPC and process optimization in EUV Lithography (Conference Presentation)

Werner Gillijns, Jae Uk Lee, Ryoung-Han Kim, 2020 .

In situ aberration measurement technique based on aerial image with optimized source

Sikun Li, Anatoly Bourov, Andreas Erdmann, 2012, Optical Systems Design.

Research on Automatic Irrigation Algorithm of Strawberry Greenhouse Based on PLC

Hao Liu, Shuting Wang, Jianshu Chen, 2013, CCTA.

NXE:3400 OPC process monitoring: model validity vs process variability

David Rio, Werner Gillijns, Christina Baerts, 2021, Advanced Lithography.

Pixel-based defect detection from high-NA optical projection images.

Andreas Erdmann, Tim Fühner, Dongbo Xu, 2014, Applied optics.

In situ aberration measurement technique based on multi-illumination settings and principal component analysis of aerial images

Lifeng Duan, Guanyong Yan, Yang Bu, 2012 .

Characterization and mitigation of 3D mask effects in extreme ultraviolet lithography

Vicky Philipsen, Eric Hendrickx, Andreas Erdmann, 2017 .