Alok P. Vasudev

Dissolution inhibitors for 157-nm photolithography

Will Conley, Charles R. Chambers, Shiro Kusumoto, 2002, SPIE Advanced Lithography.

Design of dissolution inhibitors for chemically amplified photolithographic systems

Paul Zimmerman, Charles R. Chambers, Shiro Kusumoto, 2004, SPIE Advanced Lithography.

Electrically Controlled Nonlinear Generation of Light with Plasmonics

Alok P. Vasudev, Wenshan Cai, Mark L. Brongersma, 2011, Science.