Laurent Souriau

发表

15nm HP patterning with EUV and SADP: key contributors for improvement of LWR, LER, and CDU

Vincent Wiaux, David Hellin, Johan Vertommen, 2013, Advanced Lithography.

Key Issues for the Development of a Ge CMOS Device in an Advanced IC Circuit

Paul Zimmerman, Eddy Simoen, Cedric Huyghebaert, 2006 .

Reducing extreme ultraviolet mask three-dimensional effects by alternative metal absorbers

Vicky Philipsen, Eric Hendrickx, Frank Scholze, 2017 .

Key contributors for improvement of line width roughness, line edge roughness, and critical dimension uniformity: 15 nm half-pitch patterning with extreme ultraviolet and self-aligned double patterning

Vincent Wiaux, David Hellin, Johan Vertommen, 2013 .

Study of novel EUVL mask absorber candidates

Patrick Jaenen, Vicky Philipsen, Victor Soltwisch, 2021 .

BEOL compatible high tunnel magneto resistance perpendicular magnetic tunnel junctions using a sacrificial Mg layer as CoFeB free layer cap

Arnaud Furnemont, Geoffrey Pourtois, J. Swerts, 2015 .

Fabrication of high quality Ge virtual substrates by selective epitaxial growth in shallow trench isolated Si (001) trenches

Gang Wang, Wilfried Vandervorst, Marc Heyns, 2010 .

Germanium MOSFET Devices: Advances in Materials Understanding, Process Development, and Electrical Performance

Geert Hellings, Jerome Mitard, Marc Heyns, 2008 .

Interconnects scaling challenge for sub-20nm spin torque transfer magnetic random access memory technology

Tai Min, Praveen Raghavan, Joost Bekaert, 2014, IEEE International Interconnect Technology Conference.

Experimental Observation of Back-Hopping With Reference Layer Flipping by High-Voltage Pulse in Perpendicular Magnetic Tunnel Junctions

Diana Tsvetanova, Arnaud Furnemont, Davide Crotti, 2016, IEEE Transactions on Magnetics.

A model of threading dislocation density in strain-relaxed Ge and GaAs epitaxial films on Si (100)

Gang Wang, Eddy Simoen, Marc Heyns, 2009 .

Fabrication of magnetic tunnel junctions connected through a continuous free layer to enable spin logic devices

Christopher J. Wilson, Cedric Huyghebaert, Monique Ercken, 2017 .

High Quality Ge Virtual Substrates on Si Wafers with Standard STI Patterning

Guy Brammertz, Matty Caymax, Shotaro Takeuchi, 2010 .

Single element and metal alloy novel EUV mask absorbers for improved imaging (Conference Presentation)

Kurt G. Ronse, Toshiro Itani, Vicky Philipsen, 2017 .

Interconnected magnetic tunnel junctions for spin-logic applications

Iuliana Radu, Morin Dehan, Odysseas Zografos, 2018 .

Valence band energy in confined Si1−xGex (0.28

Andre Stesmans, Marc Meuris, Laurent Souriau, 2009 .