粟雅娟

Focus Shift Impacted by Mask 3D And Comparison between Att. PSM and OMOG

董立松, 韦亚一, 刘艳松, 2015 .

Enlage the process window of patterns in 22nm node by using mask topography aware OPC and SMO

董立松, 韦亚一, 刘艳松, 2015 .