Ute Buttgereit

发表

Phase-shifting photomask repair and repair validation procedure for transparent and opaque defects relevant for the 45nm node and beyond

Christian Ehrlich, Ute Buttgereit, Klaus Boehm, 2008, European Mask and Lithography Conference.

Improving wafer level CD uniformity for logic applications utilizing mask level metrology and process

Erez Graitzer, Ute Buttgereit, Avi Cohen, 2013, Photomask Technology.

Back to square 9: a demonstration of 9" reticle capability

Dirk Beyer, Ute Buttgereit, Mathias Irmscher, 2002, Photomask Technology.

Laterally resolved off-axis phase measurements on 45-nm node production features using Phame

Ute Buttgereit, Dirk Seidel, Sascha Perlitz, 2007, SPIE Photomask Technology.

Phame: a novel phase metrology tool of Carl Zeiss for in-die phase measurements under scanner relevant optical settings

Ute Buttgereit, Thomas Scherübl, Sascha Perlitz, 2007, SPIE Advanced Lithography.

Aerial image metrology for OPC modeling and mask qualification

Peter De Bisschop, Ute Buttgereit, Ao Chen, 2017, European Mask and Lithography Conference.

CD uniformity correction on 45-nm technology non-volatile memory

Erez Graitzer, Hiroyuki Miyashita, Ute Buttgereit, 2010, Advanced Lithography.

Phame: high resolution off-axis phase shift measurements on 45nm node features

Ute Buttgereit, Dirk Seidel, Sascha Perlitz, 2008, European Mask and Lithography Conference.

In-die metrology on photomasks for low k1 lithography

Dirk Beyer, Ute Buttgereit, Thomas Scheruebl, 2009, Photomask Technology.

Automated defect disposition with AIMS AutoAnalysis

Vahagn Sargsyan, Ute Buttgereit, Arosha Goonesekera, 2017, Photomask Technology.

Process window improvement on 45nm technology non volatile memory by CD uniformity improvement

Erez Graitzer, Ute Buttgereit, Avi Cohen, 2010, Photomask Technology.

Mask tuning for process window improvement

Erez Graitzer, Ute Buttgereit, Avi Cohen, 2011, European Mask and Lithography Conference.

MeRiT repair verification using in-die phase metrology Phame

Ute Buttgereit, Robert Birkner, Robert Dipl Ing Stelzner, 2009, European Mask and Lithography Conference.

Determination of mask layer stress by placement metrology

Ute Buttgereit, Mathias Irmscher, Eric Cotte, 2005, SPIE Photomask Technology.

Reducing the impact of reticle CD-non-uniformity of multiple structures by dose corrections based on aerial image measurements

Jo Finders, Ute Buttgereit, Thomas Scheruebl, 2010, Advanced Lithography.

Investigation of polarization effects on new mask materials

Hans Willy Becker, Ute Buttgereit, Silvio Teuber, 2005, SPIE Advanced Lithography.

A study of closed-loop application for logic patterning

Erez Graitzer, Ute Buttgereit, Frank Sundermann, 2012, Other Conferences.

Using the AIMS 45-193i for hyper-NA imaging applications

Peter De Bisschop, Vicky Philipsen, Ute Buttgereit, 2007, SPIE Photomask Technology.

Study of rigorous effects and polarization on phase shifting masks through simulations and in-die phase measurements

Ki-Ho Baik, Ute Buttgereit, Thomas Scherübl, 2007, SPIE Advanced Lithography.

Recent results on EUV mask blank multilayers and absorbers

Ute Buttgereit, Rainer Lebert, Christian Wies, 2005, SPIE Advanced Lithography.

Investigation of phase distribution using Phame in-die phase measurements

Ute Buttgereit, Sascha Perlitz, 2009, Advanced Lithography.

Mask CD uniformity metrology for logic patterning and its correlation to wafer data

Ute Buttgereit, Frank Sundermann, Thomas Trautzsch, 2012, Other Conferences.

Extended process window using variable transmission PSM materials for 65 nm and 45 nm node

Ute Buttgereit, Mathias Irmscher, Corinna Koepernik, 2006, Photomask Japan.

Improving ORC methods and hotspot detection with the usage of aerial images metrology

Ute Buttgereit, Thomas Thaler, François Weisbuch, 2020 .

Performance data of a variable transmission phase shifting mask blank for 193nm lithography enhanced by inspection contrast tuning

Ute Buttgereit, Hans Becker, Konrad Knapp, 2005, SPIE Optical Systems Design.

Effective use of aerial image metrology for calibration of OPC models

John L. Sturtevant, Ute Buttgereit, Ao Chen, 2017, Advanced Lithography.

Phase behavior through pitch and duty cycle and its impact on process window

Peter De Bisschop, Vicky Philipsen, Ute Buttgereit, 2009, Photomask Japan.

New solutions for inspection contrast tuning, enhanced chemical durability, and a new ultrahigh-transmission PSM

Ute Buttgereit, Frank Schmidt, Konrad Knapp, 2004, SPIE Photomask Technology.

Automated hotspot analysis with aerial image CD metrology for advanced logic devices

Young-Keun Yoon, Ute Buttgereit, Thomas Trautzsch, 2014, Photomask Technology.

Novel solution for in-die phase control under scanner equivalent optical settings for 45-nm node and below

Ute Buttgereit, Thomas Scherübl, Sascha Perlitz, 2007, Photomask Japan.

Patterning of Ta/SiO2 high transmission EAPSM material for 193nm technology

Hans Willy Becker, Ute Buttgereit, Joerg Butschke, 2005, Photomask Japan.

Comparative study of bi-layer attenuating phase-shifting masks for hyper-NA lithography

Geert Vandenberghe, Vicky Philipsen, Eric Hendrickx, 2006, Photomask Japan.

High-performance 6-inch EUV mask blanks produced under real production conditions by ion-beam sputter deposition

Hans Willy Becker, Torsten Feigl, Norbert Kaiser, 2002, Photomask Technology.

Integrated photomask defect printability check, mask repair, and repair validation procedure for phase-shifting masks for the 45-nm node and beyond

Christian Ehrlich, Ute Buttgereit, Klaus Boehm, 2007, SPIE Photomask Technology.

Update on the EUVL mask blank activity at Schott Lithotec

Larissa Juschkin, Ute Buttgereit, Rainer Lebert, 2003, SPIE Photomask Technology.

Production challenges of making EUV mask blanks

Ute Buttgereit, Rainer Lebert, Christian Wies, 2005, Other Conferences.

Antireflection solutions for next generation 193-nm binary and phase-shifting masks

Ute Buttgereit, Hans Becker, Konrad Knapp, 2005, SPIE Photomask Technology.

Development of a new PSM film system for 157-nm extensible to high-transmission 193 nm lithography

Hans Willy Becker, Marie Angelopoulos, Ute Buttgereit, 2003, SPIE Photomask Technology.

Short feedback loop for OPC model based on wafer level CD

Ute Buttgereit, Peter Philipp, Lloyd C. Litt, 2014, Photomask Technology.

Process window enhancement for 45-nm node using alterable transmission phase-shifting materials

Ute Buttgereit, Thomas Scheruebl, Mathias Irmscher, 2006, SPIE Photomask Technology.

Phase metrology on 45-nm node phase-shift mask structures

Ute Buttgereit, Sascha Perlitz, Malahat Tavassoli, 2008, SPIE Advanced Lithography.

Improvement of temperature uniformity during prebake process in mask blank production

Ute Buttgereit, Fredi Schubert, Bernd Beier, 2001, European Mask and Lithography Conference.

Method and apparatus for inspecting a mask

Ute Buttgereit, Thomas Trautzsch, Thomas Thaler, 2013 .

Phame: phase measurements on 45nm node phase shift features

Peter De Bisschop, Vicky Philipsen, Ute Buttgereit, 2008, Photomask Japan.

Improved CD control for 45-40 nm CMOS logic patterning: anticipation for 32-28 nm

Erez Graitzer, Ute Buttgereit, Frank Sundermann, 2010, Advanced Lithography.

In-die actinic metrology on photomasks for low k1 lithography

Dirk Beyer, Ute Buttgereit, Axel Zibold, 2009, Lithography Asia.

Performance data on new tunable attenuating PSM for 193-nm and 157-nm lithography

Hans Willy Becker, Marie Angelopoulos, Ute Buttgereit, 2004, Photomask Japan.

Absorber stack optimization toward EUV lithography mask blank pilot production

Ute Buttgereit, Joerg Butschke, Corinna Koepernik, 2004, SPIE Photomask Technology.

WLCD: a new system for wafer level CD metrology on photomasks

Wolfgang Degel, Sven Martin, Ute Buttgereit, 2009, Advanced Lithography.