Thomas Scheruebl
发表
Christian Ehrlich,
Ute Buttgereit,
Klaus Boehm,
2008,
European Mask and Lithography Conference.
Thomas Scheruebl,
Anthony Garetto,
Renzo Capelli,
2014
.
Thomas Scheruebl,
Ofir Sharoni,
Yael Sufrin,
2019,
Photomask Technology.
Will Conley,
Thomas Scheruebl,
Eric Poortinga,
2007,
European Mask and Lithography Conference.
Thomas Scheruebl,
Norbert Rosenkranz,
Wolfgang Harnisch,
2005,
SPIE/COS Photonics Asia.
Yuri Granik,
Germain Fenger,
Eric Hendrickx,
2009,
Advanced Lithography.
Thomas Scheruebl,
Ofir Sharoni,
Yael Sufrin,
2020,
2020 31st Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC).
Erez Graitzer,
Thomas Scheruebl,
Robert Birkner,
2008,
Photomask Japan.
Jo Finders,
Ute Buttgereit,
Thomas Scheruebl,
2010,
Advanced Lithography.
Yasutaka Morikawa,
Naoya Hayashi,
Takashi Adachi,
2007,
SPIE Advanced Lithography.
Thomas Scheruebl,
Norbert Rosenkranz,
Wolfgang Harnisch,
2004
.
Christian Ehrlich,
Ute Buttgereit,
Klaus Boehm,
2007,
SPIE Photomask Technology.
Thomas Scheruebl,
Ulrich Stroessner,
Thomas Thaler,
2009,
Photomask Technology.
Hiroyuki Miyashita,
Thomas Scheruebl,
Ernesto Villa,
2010,
Photomask Japan.
Thomas Scheruebl,
Robert Brunner,
Alexander Menck,
2004,
European Mask and Lithography Conference.
Thomas Scheruebl,
Wolfgang Harnisch,
Robert Brunner,
2004,
SPIE Advanced Lithography.
Ute Buttgereit,
Thomas Scheruebl,
Mathias Irmscher,
2006,
SPIE Photomask Technology.
Thomas Scheruebl,
Anthony Garetto,
Michael Himmelhaus,
2016,
Photomask Technology.
Thomas Scheruebl,
Wolfgang Harnisch,
Yuji Kobiyama,
2004,
Photomask Japan.