Christine Ouyang

Solvent development processing of chemically amplified resists: chemistry, physics, and polymer science considerations

Marie Krysak, Christopher K. Ober, Jin-Kyun Lee, 2011, Advanced Lithography.

Oxide nanoparticle EUV resists: toward understanding the mechanism of positive and negative tone patterning

Markos Trikeriotis, Marie Krysak, Emmanuel P. Giannelis, 2013, Advanced Lithography.

A new inorganic EUV resist with high-etch resistance

Markos Trikeriotis, Marie Krysak, Brian Cardineau, 2012, Advanced Lithography.

Patterning conventional photoresists in environmentally friendly silicone fluids

Marie Krysak, Christopher K. Ober, Jin-Kyun Lee, 2011, Advanced Lithography.

Negative-tone development of photoresists in environmentally friendly silicone fluids

Christopher K. Ober, Jin-Kyun Lee, Christine Ouyang, 2012, Other Conferences.

Nanoparticle photoresists from HfO2 and ZrO2 for EUV patterning

Markos Trikeriotis, Brian Cardineau, Robert L. Brainard, 2012 .

Nanoparticle Photoresists: Ligand Exchange as a New, Sensitive EUV Patterning Mechanism

Markos Trikeriotis, Emmanuel P. Giannelis, Christopher K. Ober, 2013 .

Environmentally friendly patterning of thin films in linear methyl siloxanes

Marie Krysak, Christopher K. Ober, Christine Ouyang, 2012 .