Stephen Dellarochetta

Comprehensive focus-overlay-CD correlation to identify photolithographic performance

Mircea Dusa, Terrence E. Zavecz, Bo Su, 1996, Advanced Lithography.

Photolithographic lens characterization of critical dimension variation using empirical focal-plane modeling

Mircea Dusa, Terrence E. Zavecz, Bo Su, 1997, Advanced Lithography.

Effects of tungsten deposition on site focal plane deviation

Stephen Dellarochetta, John Coniff, Terry L. Von Salza Brown, 1994, Advanced Lithography.