Susumu Nagashige

Evaluation of bi-layer TaSix absorber on buffer for EUV mask

Yasushi Nishiyama, Iwao Nishiyama, Akira Tamura, 2006, SPIE Photomask Technology.

New repair of clear defects on half-tone PSM using Ga implantation

Kunihiro Hosono, Yasutaka Kikuchi, Susumu Nagashige, 2003, Photomask Japan.

Detection and repair of multiphase defects on alternating phase-shift masks for DUV lithography

Yoshiro Yamada, Yuichi Matsuzawa, Susumu Nagashige, 1999, Photomask Technology.

Optimization of ArF alternating phase-shifting mask structure for 100-nm node and inspection of phase defects

Yoshiro Yamada, Susumu Nagashige, Shinji Akima, 2002, SPIE Photomask Technology.

The study of defect inspection with die to model based on aerial image

Shinji Kunitani, Susumu Nagashige, Atsushi Kobayashi, 2008, Photomask Japan.