Arcadiy Vilenkin

Advanced 2D structures metrology with CD-SEM for OPC challenges

Ofer Adan, Ovadya Menadeva, Ram Peltinov, 2005, SPIE/COS Photonics Asia.

CD-SEM application for generic analysis of two-dimensional features on wafers and reticles

Ofer Adan, Ovadya Menadeva, Ram Peltinov, 2004, SPIE Advanced Lithography.

Height and sidewall angle SEM metrology accuracy

Ofer Adan, Ovadya Menadeva, Ram Peltinov, 2004, SPIE Advanced Lithography.

Verification of height and sidewall angle SEM metrology accuracy using Monte Carlo simulation

Ofer Adan, Ovadya Menadeva, Ram Peltinov, 2005, SPIE/COS Photonics Asia.

Mask metrology 2D application for measurement of OPC features and corner roundness

Ovadya Menadeva, Ram Peltinov, Roman Kris, 2004, Photomask Japan.

Corner roundness and contact area algorithms for reticle metrology through the use of region connectivity extraction

Ovadya Menadeva, Ram Peltinov, Roman Kris, 2003, SPIE Photomask Technology.