Mike Canjemi

Imaging contrast improvement for 160-nm line features using subresolution assist features with binary, six percent ternary attenuated phase-shift mask with process-tuned resist

Martin McCallum, John S. Petersen, Nishrin Kachwala, 1999, Advanced Lithography.

Imaging contrast improvement for 160nm line features using sub resolution assist features with binary, 6% ternary attenuated phase shift mask with process tuned resist

Martin McCallum, John S. Petersen, Nishrin Kachwala, 1999 .