Gerd Krause

Geometry-based across wafer process control in a dual damascene scenario

Gerd Krause, Detlef Hofmann, Boris Habets, 2018, Advanced Lithography.

In-depth analysis and characterization of a dual damascene process with respect to different CD

Gerd Krause, Detlef Hofmann, Boris Habets, 2018, Advanced Lithography.

Process machine, particularly for editing and / or inspecting substrates

Gerd Krause, Jakob Szekeresch, Klaus Oppelt, 2010 .