Bob Gleason

发表

Source optimization and mask design to minimize MEEF in low k1 lithography

Guangming Xiao, Tom Cecil, Lingyong Pang, 2008, Photomask Japan.

Optical properties of alternating phase-shifting masks

Wen-Hao Cheng, Bob Gleason, W. Cheng, 2006, SPIE Photomask Technology.

Deep subwavelength mask assist features and mask errors printability in high NA lithography

Wen-Hao Cheng, Vikram Tolani, Bob Gleason, 2006, SPIE Photomask Technology.

Enhancing fullchip ILT mask synthesis capability for IC manufacturability

Guangming Xiao, Bob Gleason, D. H. Son, 2011, Advanced Lithography.

Exploration of complex metal 2D design rules using inverse lithography

Steve Prins, Guangming Xiao, Bob Gleason, 2009, Advanced Lithography.

Exploring the impact of mask making constraints on double patterning design rules

Bob Gleason, Paul Rissman, Robert Sinn, 2011, Photomask Technology.

EUV multilayer defect compensation (MDC) by absorber pattern modification: improved performance with deposited material and other progresses

Ying Li, Masaki Satake, Vikram Tolani, 2012, Photomask Technology.

Evaluation of lithographic benefits of using ILT techniques for 22nm-node

Ki-Ho Baik, Yunfei Deng, Jongwook Kye, 2010, Advanced Lithography.

Considering MEEF in inverse lithography technology (ILT) and source mask optimization (SMO)

Vikram Tolani, Guangming Xiao, Bob Gleason, 2008, Photomask Technology.

Source-mask co-optimization (SMO) using level set methods

Vikram Tolani, Bob Gleason, Linyong Pang, 2009, Photomask Technology.

Bridging the gaps between mask inspection/review systems and actual wafer printability using computational metrology and inspection (CMI) technologies

Masaki Satake, Vikram Tolani, Linyong Pang, 2012, Photomask Technology.

SMO applied to contact layers at the 32nm node and below with consideration of MEEF and MRC

Bob Gleason, Se-Jin Park, Robert Sinn, 2011, Photomask Technology.

From Computational Lithography to Computational Inspection: Inverse Lithography Technology (ILT) and Inverse Inspection Technology (IIT)

Ki-Ho Baik, Vikram Tolani, Guangming Xiao, 2010 .

Comparison of clear-field and dark-field images with optimized masks

Bob Gleason, Thuc Dam, Robert Sinn, 2011, Advanced Lithography.

Inverse Lithography Technology (ILT) Enabled Source Mask Optimization (SMO)

Ki-Ho Baik, Vikram Tolani, Guangming Xiao, 2009 .

Inverse lithography as a DFM tool: accelerating design rule development with model-based assist feature placement, fast optical proximity correction and lithographic hotspot detection

Steve Prins, Guangming Xiao, Bob Gleason, 2008, SPIE Advanced Lithography.

Evaluation of inverse lithography technology for 55nm-node memory device

Ki-Ho Baik, Ying Cui, Donggyu Yim, 2008, SPIE Advanced Lithography.

Source mask optimization (SMO) at full chip scale using inverse lithography technology (ILT) based on level set methods

Vikram Tolani, Guangming Xiao, Bob Gleason, 2009, Lithography Asia.

Optimization from design rules, source and mask, to full chip with a single computational lithography framework: level-set-methods-based inverse lithography technology (ILT)

Vikram Tolani, Guangming Xiao, Bob Gleason, 2010, Advanced Lithography.

Litho/Design Co-Optimization and Area Scaling for the 22-nm Logic Node

Ki-Ho Baik, Bob Gleason, Scott William Jessen, 2010 .

Source-mask optimization (SMO): from theory to practice

Ki-Ho Baik, Vikram Tolani, Bob Gleason, 2010, Advanced Lithography.

Trade-off between inverse lithography mask complexity and lithographic performance

Sang-Gyun Woo, Vikram Tolani, Guangming Xiao, 2009, Photomask Japan.

Design-based mask metrology hot spot classification and recipe making through random pattern recognition method

Ki-Ho Baik, Ying Cui, Bob Gleason, 2006, SPIE Photomask Technology.

Validation and application of a mask model for inverse lithography

Thuc H. Dam, Bob Gleason, Xin Zhou, 2008, SPIE Advanced Lithography.

Intrafield linewidth variances in 0.25 μm i‐line lithography

Bob Gleason, Crid Yu, Hua-Yu Liu, 1995 .

Effect of Reticle Erros on Systematic Intrafield Line Width Variations

Bob Gleason, Crid Yu, Hua–yu Liu, 1995 .