Yasuhiko Sugiyama

Advanced photomask repair technology for 65-nm lithography (1)

Ryoji Hagiwara, Osamu Takaoka, Mamoru Okabe, 2004, Photomask Japan.

Advanced photomask repair technology for 65-nm lithography

Youichi Usui, Osamu Suga, Ryoji Hagiwara, 2006, Photomask Japan.

Development of new FIB technology for EUVL mask repair

Osamu Suga, Anto Yasaka, Tsuyoshi Amano, 2011, Advanced Lithography.

Photomask repair technology by using gas field ion source

Osamu Takaoka, Kazuo Aita, Osamu Matsuda, 2012, Other Conferences.

Study on the Antihyperlipidemic Effect of Clinofibrate by Using the HPLC Method

Akira Tanaka, Tetsuo Wakabayashi, Yasuhiko Sugiyama, 1990 .