Syuichi Kikuchi

Advanced photomask repair technology for 65-nm lithography (1)

Ryoji Hagiwara, Osamu Takaoka, Mamoru Okabe, 2004, Photomask Japan.

A semi-automated AFM photomask repair process for manufacturing application using SPR6300

Ryoji Hagiwara, Osamu Takaoka, Hiroyuki Miyashita, 2007, SPIE Photomask Technology.

Damage analysis of EUV mask under Ga focused ion beam irradiation

Osamu Suga, Ryoji Hagiwara, Anto Yasaka, 2008, Photomask Japan.