Jinho Ahn

发表

Development of full-size EUV pellicle with thermal emission layer coating

Changhun Lee, Juhee Hong, Chulkyun Park, 2018, Photomask Technology.

Impact of residual stress on the deflection of extreme ultraviolet pellicles

Jinho Ahn, Junghwan Kim, Haneul Kim, 2021 .

Very Thin Extreme Ultraviolet Mask Absorber Material for Extremely Fine Pitch Patterning

Jae Uk Lee, Seongchul Hong, Jinho Ahn, 2013 .

Mechanical deflection of a free-standing pellicle for extreme ultraviolet lithography

Hye-Keun Oh, Dai-Gyoung Kim, Zahid Hussain Shamsi, 2015 .

Improved imaging properties of thin attenuated phase shift masks for extreme ultraviolet lithography

Sangsul Lee, Jae Uk Lee, Seongchul Hong, 2013 .

EUV Mask and Mask Metrology

Han-Ku Cho, Jinho Ahn, 2008 .

Damage Free Particle Removal from Extreme Ultraviolet Lithography Mask Layers by High Energy Laser Shock Wave Cleaning

Ahmed Busnaina, Jinho Ahn, Jin-Goo Park, 2008 .

Carbon contamination of EUV mask and its effect on CD performance

Sangsul Lee, Jae Uk Lee, Inhwan Lee, 2011 .