Srinivasan Nirmalgandhi

Evaluating the performance of a 193-nm hyper-NA immersion scanner using scatterometry

Harry J. Levinson, Bruno La Fontaine, Oleg Kritsun, 2007, SPIE Advanced Lithography.

Evaluating a scatterometry-based focus monitor technique for hyper-NA lithography

Harry J. Levinson, Bruno La Fontaine, Oleg Kritsun, 2007, SPIE Advanced Lithography.