Haiko Rolff
发表
Richard Wistrom,
Alexander Lajn,
Haiko Rolff,
2017,
Photomask Japan.
Guido Schiffelers,
Shinpei Kondo,
Norihito Fukugami,
2014,
Photomask and Next Generation Lithography Mask Technology.
Black border, mask 3D effects: covering challenges of EUV mask architecture for 22nm node and beyond
Guido Schiffelers,
Shinpei Kondo,
Norihito Fukugami,
2014,
European Mask and Lithography Conference.
Thorsten Schedel,
Markus Bender,
Pavel Nesládek,
2015,
Other Conferences.
Alexander Lajn,
Haiko Rolff,
Olga Hortenbach,
2017,
Photomask Japan.
Norihito Fukugami,
Brid Connolly,
Natalia Davydova,
2013,
Other Conferences.