Toshiyuki Toyoshima

Below 70-nm contact hole pattern with RELACS process on ArF resist

Yusuke Takano, Hatsuyuki Tanaka, Shinji Tarutani, 2003, SPIE Advanced Lithography.

Advanced microlithography process with chemical shrink technology

Hatsuyuki Tanaka, Naoki Yasuda, Takeo Ishibashi, 2000, Advanced Lithography.

Advanced Micro-Lithography Process with Chemical Shrink Technology.

Hatsuyuki Tanaka, Takeo Ishibashi, Yoshiaki Kinoshita, 2001 .