Kathleen A. Gehoski

Bilayer and trilayer lift-off processing for i-line and DUV lithography

Douglas J. Resnick, David P. Mancini, Laura L. Popovich, 2002, SPIE Advanced Lithography.

New methods for fabricating step and flash imprint lithography templates

William J. Dauksher, Kevin J. Nordquist, Eric S. Ainley, 2002, Workshop on Nanostructure Science, Metrology, and Technology.

High-resolution templates for step and flash imprint lithography

William J. Dauksher, Kevin J. Nordquist, Eric S. Ainley, 2002, SPIE Advanced Lithography.

Evaluation of the Imprio 100 Step and Flash Imprint Lithography tool

Douglas J. Resnick, David P. Mancini, Kathleen A. Gehoski, 2004, SPIE Advanced Lithography.

Development of an etch-definable lift-off process for use with step and flash imprint lithography

William J. Dauksher, Ngoc V. Le, Kathleen A. Gehoski, 2005, SPIE Advanced Lithography.

Low surface energy polymeric release coating for improved contact print lithography

Douglas J. Resnick, David P. Mancini, Daniel Chang, 2001, SPIE Photomask Technology.

Indium tin oxide template development for step and flash imprint lithography

William J. Dauksher, Kevin J. Nordquist, Eric S. Ainley, 2005, SPIE Advanced Lithography.

Mesoscale modeling for SFIL simulating polymerization kinetics and densification

Yi Wei, William J. Dauksher, Kevin J. Nordquist, 2004, SPIE Advanced Lithography.