P. De Bisschop

Experimental proximity matching of ArF scanners

Joost Bekaert, L. Van Look, G. Schiffelers, 2008, Lithography Asia.

Impact of stochastic effects on EUV printability limits

A. Vaglio Pret, P. De Bisschop, J. Van de Kerkhove, 2014, Advanced Lithography.

Opportunities and challenges in device scaling by the introduction of EUV lithography

K. Ronse, D. Verkest, E. Hendrickx, 2012, 2012 International Electron Devices Meeting.

Stochastic effects in EUV lithography

E. Hendrickx, P. De Bisschop, P. de Bisschop, 2018, Advanced Lithography.

Stochastic printing failures in EUV lithography

E. Hendrickx, P. De Bisschop, P. de Bisschop, 2019, Advanced Lithography.

On the dependencies of the stochastic patterning-failure cliffs in EUVL lithography

E. Hendrickx, P. De Bisschop, P. de Bisschop, 2020, Advanced Lithography.