Yoshihisa Iba

Antireflection and opaque coating film materials for Ta/SiC x-ray masks

Takao Taguchi, Hajime Aoyama, Masaki Yamabe, 1997, Photomask and Next Generation Lithography Mask Technology.

Effect of SiC x-ray masks on alignment accuracy of heterodyne alignment

Takao Taguchi, Hajime Aoyama, Makoto Fukuda, 1997, Advanced Lithography.

STT MRAM Development and Its Integration with BEOL Process for Embedded Applications

Masaaki Nakabayashi, Masaki Aoki, Toshihiro Sugii, 2012 .