Fumiaki Kumasaka

Antireflection and opaque coating film materials for Ta/SiC x-ray masks

Takao Taguchi, Hajime Aoyama, Masaki Yamabe, 1997, Photomask and Next Generation Lithography Mask Technology.

Ultimate fine-pitch resist patterning using the ASET-HINA

Iwao Nishiyama, Hiroaki Oizumi, Fumiaki Kumasaka, 2006, SPIE Advanced Lithography.

Effect of SiC x-ray masks on alignment accuracy of heterodyne alignment

Takao Taguchi, Hajime Aoyama, Makoto Fukuda, 1997, Advanced Lithography.

Precise Stress Control of Ta Absorber using Low Stress Alumina Etching Mask for X-Ray Mask Fabrication

Takao Taguchi, Hajime Aoyama, Masaki Yamabe, 1996 .

Overlay evaluation of proximity x-ray lithography in 100 nm device fabrication

Takao Taguchi, Hajime Aoyama, Hirofumi Morita, 2000 .