Carsten Hartig

发表

Hybrid metrology solution for 1X node technology

Alok Vaid, Hiroki Kawada, Cornel Bozdog, 2012, Advanced Lithography.

Material contrast based inline metrology: process verification and control using back scattered electron imaging on CD-SEM

Alok Vaid, Shimon Levi, Ofer Adan, 2013, Advanced Lithography.

In-line E-beam wafer metrology and defect inspection: the end of an era for image-based critical dimensional metrology? New life for defect inspection

Alok Vaid, Benjamin Bunday, Oliver D. Patterson, 2013, Advanced Lithography.

Tool-to-tool matching issues due to photoresist shrinkage effects

Alok Vaid, Benjamin Bunday, Aaron Cordes, 2011, Advanced Lithography.