Ad Leeuwestein

Aerial image based lens metrology for wafer steppers

Joseph J. M. Braat, Tomoyuki Matsuyama, Augustus J. E. M. Janssen, 2006, SPIE Advanced Lithography.

Aberration retrieval for high-NA optical systems using the extended Nijboer-Zernike theory

Joseph J. M. Braat, Augustus J. E. M. Janssen, Peter Dirksen, 2004, SPIE Advanced Lithography.

Determination of resist parameters using the extended Nijboer-Zernike theory

Augustus J. E. M. Janssen, David Van Steenwinckel, Peter Dirksen, 2004, SPIE Advanced Lithography.

Experimental determination of lens aberrations from the intensity point-spread function in the focal region

Joseph J. M. Braat, Augustus J. E. M. Janssen, Casper A. H. Juffermans, 2003, SPIE Advanced Lithography.