Jörg Thiele

A method for generating an image defect-avoiding mask layout for a mask

Armin Semmler, Christof Dr. Bodendorf, Christian Dr. Meyne, 2005 .

Call for an industry standard for pattern transfer models for usage in OPC and design for manufacturability

Wolfgang Grimm, Thomas Roessler, Jörg Thiele, 2006, SPIE Advanced Lithography.

Annotated layout optimization

Roderick Köhle, Jörg Thiele, 2006, SPIE Advanced Lithography.

OPC with customized asymmetric pupil illumination fill

Thomas Mülders, Jörg Thiele, Karin Kurth, 2005, SPIE Photomask Technology.

Improved manufacturability by OPC based on defocus data

Armin Semmler, Henning Haffner, Ines Anke, 2003, SPIE Advanced Lithography.