John C. Robinson

发表

A system to optimize mix-and-match overlay in lithography

Yuuki Ishii, Shinji Wakamoto, Koji Yasukawa, 2008, SPIE Advanced Lithography.

Weighted least squares regression for advanced overlay control

Guy Cohen, Dana Klein, John C. Robinson, 2012, Advanced Lithography.

A comparison of methods for in-chip overlay control at the 65-nm node

John C. Robinson, Mike Adel, Jorge M. Poplawski, 2004, SPIE Advanced Lithography.

Lithography and metrology overlay troubleshooting by advanced query and multivariate analysis

Jens Krause, Bernd Schulz, John C. Robinson, 2003, SPIE Advanced Lithography.

High-order stitching overlay analysis for advanced process control

David Tien, Howard Chen, John C. Robinson, 2011, Advanced Lithography.

Integrated production overlay field-by-field control for leading edge technology nodes

Chen Li, Young Ki Kim, John C. Robinson, 2014, Advanced Lithography.

The study and simulation of high-order overlay control including field-by-field methodologies

John C. Robinson, Dongsub Choi, Myoung-Soo Kim, 2009, Advanced Lithography.

High-volume manufacturing device overlay process control

Sangjun Han, Honggoo Lee, DongSub Choi, 2017, Advanced Lithography.

Data feed-forward for improved optical CD and film metrology

Qiang Zhao, John C. Robinson, Zhengquan Tan, 2012, Advanced Lithography.

Sampling for advanced overlay process control

John C. Robinson, Pavel Izikson, Cindy Kato, 2009, Advanced Lithography.

Simultaneous optimization of dose and focus controls in advanced ArF immersion scanners

Daniel Kandel, John C. Robinson, Pavel Izikson, 2010, Advanced Lithography.

Characterization of overlay tolerance requirements for via to metal alignment

John C. Robinson, Richard C. Elliott, Brad Smith, 1999, Advanced Lithography.

Overlay control methodology comparison: field-by-field and high-order methods

Chui-Fu Chiu, Chun-Yen Huang, Chiang-Lin Shih, 2012, Advanced Lithography.

Device overlay method for high volume manufacturing

Sangjun Han, Honggoo Lee, Myoungsoo Kim, 2016, SPIE Advanced Lithography.

Special Section Guest Editorial: Control of Integrated Circuit Patterning Variance, Part 3: Pattern Roughness, Local Uniformity, and Stochastic Defects

Gian F. Lorusso, John C. Robinson, Tim Brunner, 2018 .

Improved overlay control using robust outlier removal methods

Osamu Fujita, Dana Klein, John C. Robinson, 2011, Advanced Lithography.

Advanced modeling strategies to improve overlay control for 32-nm lithography processes

David Tien, John C. Robinson, Joerg Reiss, 2009, Advanced Lithography.

Application of overlay modeling and control with Zernike polynomials in an HVM environment

John C. Robinson, Bill Pierson, Hoyoung Heo, 2016, SPIE Advanced Lithography.

CPE run-to-run overlay control for High Volume Manufacturing

John C. Robinson, Christian Sparka, Bill Pierson, 2015, 2015 26th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC).

Litho cell control using MPX

John C. Robinson, Chris Nelson, Brad Eichelberger, 2007, SPIE Advanced Lithography.

In-cell overlay metrology by using optical metrology tool

Sangjun Han, Honggoo Lee, DongSub Choi, 2018, Advanced Lithography.

Sampling for advanced overlay process control

John C. Robinson, Dongsub Choi, Doug Sutherland, 2008, SPIE Advanced Lithography.

Characterization of optical proximity correction features

John L. Sturtevant, Kevin D. Lucas, John Miller, 2001, SPIE Advanced Lithography.

Spectral tunability for accuracy, robustness, and resilience

Sangjun Han, Honggoo Lee, Eran Amit, 2018 .

Advanced overlay: sampling and modeling for optimized run-to-run control

John C. Robinson, Karsten Gutjahr, Lokesh Subramany, 2016, SPIE Advanced Lithography.

High order overlay modeling and APC simulation with Zernike-Legendre polynomials

DongSub Choi, John C. Robinson, Kangsan Lee, 2015, Advanced Lithography.

Mask registration and wafer overlay

Frank Laske, Klaus-Dieter Roeth, John C. Robinson, 2010, Advanced Lithography.

Patterned wafer geometry grouping for improved overlay control

Sangjun Han, Pradeep Vukkadala, Honggoo Lee, 2017, Advanced Lithography.

Manufacturing considerations for implementation of scatterometry for process monitoring

Ibrahim Abdulhalim, Joel L. Seligson, John C. Robinson, 2000, Advanced Lithography.

Utilizing overlay target noise metrics for improved process control

Sean Hannon, John C. Robinson, Chris Nelson, 2005, SPIE Advanced Lithography.

In-line focus monitoring and fast determination of best focus using scatterometry

David Tien, John C. Robinson, Christian Sparka, 2014, Advanced Lithography.

Mask registration impact on intrafield on-wafer overlay performance

DongSub Choi, You Seung Jin, Frank Laske, 2011, Advanced Lithography.

Clean focus, dose and CD metrology for CD uniformity improvement

Sangjun Han, Honggoo Lee, John C. Robinson, 2018, Advanced Lithography.

HVM capabilities of CPE run-to-run overlay control

John C. Robinson, Karsten Gutjahr, Christian Sparka, 2015, Advanced Lithography.

Yield loss in lithographic patterning at the 65nm node and beyond

John C. Robinson, Kevin M. Monahan, Matt Hankinson, 2004, SPIE Advanced Lithography.

The challenges of transitioning from linear to high-order overlay control in advanced lithography

David Tien, John C. Robinson, Chin-Chou Kevin Huang, 2007, SPIE/COS Photonics Asia.

Study of overlay in EUV/ArF mix and match lithography

Klaus-Dieter Roeth, John C. Robinson, Dongsub Choi, 2013, Advanced Lithography.

Improved overlay control through automated high order compensation

Yuuki Ishii, Shinji Wakamoto, Koji Yasukawa, 2007, SPIE Advanced Lithography.

An integrated approach to the determination of a manufacturable process window in advanced microlithography

Shaunee Cheng, Gian F. Lorusso, John C. Robinson, 2006, SPIE Advanced Lithography.

Improved accuracy and robustness for advanced DRAM with tunable multi-wavelength imaging and scatterometry overlay metrology

Sangjun Han, Honggoo Lee, Eran Amit, 2019, Advanced Lithography.

Inline Part Average Testing (I-PAT) for automotive die reliability

John C. Robinson, Kara Sherman, David W. Price, 2020, Advanced Lithography.

Improved scanner matching using scanner fleet matcher (SFM)

David Tien, John C. Robinson, Chin-Lung Lee, 2010, Advanced Lithography.

The emergence of inline screening for high volume manufacturing

John C. Robinson, Oreste Donzella, Barry Saville, 2021, Advanced Lithography.