Johannes van Wingerden

Process, design and optical proximity correction requirements for the 65nm device generation

Vincent Wiaux, Geert Vandenberghe, Will Conley, 2003, SPIE Advanced Lithography.

Evaluating design for manufacturing with process capability analysis

Laurent Le Cam, Yuri Aksenov, Peter Dirksen, 2005, SPIE Advanced Lithography.

Optimization of substrate reflectivity, resist thickness, and resist absorption for CD control and resolution

Johannes van Wingerden, 1999, Advanced Lithography.

Lithographic process optimization using process capability analysis

Yorick Trouiller, Casper A. H. Juffermans, Peter Dirksen, 2003, SPIE Advanced Lithography.

Experimental verification of improved printability for litho-driven designs

Jerome Belledent, Laurent Le Cam, Yorick Trouiller, 2006, SPIE Advanced Lithography.

Bottom-ARC optimization methodology for 0.25-μm lithography and beyond

Geert Vandenberghe, James E. Lamb, Patrick Jaenen, 1998, Advanced Lithography.

SPM characterizaton of anomalies in phase-shift mask and their effect on wafer features

Geert Vandenberghe, A. Meyyappan, Sylvain Muckenhirn, 2001, SPIE Advanced Lithography.