Silke Paul

Raman metrology for advanced CMOS devices - advantages and challenges

Steve McCoy, Patrick J. McNally, D. Bolze, 2009 .

THERMAL MODEL OF RAPID THERMAL PROCESSING SYSTEMS

Silke Paul, Jochen Urban, Werner Blersch, 1999 .

Challenges for ultra-shallow junction formation technologies beyond the 90 nm node

N. Acharya, Paul Janis Timans, Silke Paul, 2003, 11th IEEE International Conference on Advanced Thermal Processing of Semiconductors. RTP 2003.

Advanced activation of ultra-shallow junctions using flash-assisted RTP

Peter Pichler, J. Gelpey, Silke Paul, 2005 .

Implant Annealing – An Evolution from Soak over Spike to Millisecond Annealing

Silke Paul, Wilfried Lerch, 2008 .

Distribution and segregation of arsenic at the SiO2/Si interface

Heiner Ryssel, Peter Pichler, Wolfgang Windl, 2008 .

Experimental investigations and simulation of the deactivation of arsenic during thermal processes after activation by SPER and spike annealing

H. Kheyrandish, Clement Tavernier, Peter Pichler, 2008 .