Harald Dobberstein

Inspection and repair for imprint lithography at 32 nm and below

S. V. Sreenivasan, Holger Sailer, Joerg Butschke, 2009, Photomask Japan.

High-resolution e-beam repair for nanoimprint templates

Mathias Irmscher, Markus Waiblinger, Klaus Edinger, 2009, Photomask Technology.