Angelique Nachtwein

Advanced wavefront engineering for improved imaging and overlay applications on a 1.35 NA immersion scanner

Frank Staals, Jo Finders, Alena Andryzhyieuskaya, 2011, Advanced Lithography.

Best focus shift mitigation for extending the depth of focus

L. Depre, Russell Dover, Angelique Nachtwein, 2013, Advanced Lithography.

The use of computational inspection to identify process window limiting hotspots and predict sub-15nm defects with high capture rate

Lei Liu, Jae-Min Shin, Dong-Woon Park, 2017, Advanced Lithography.