Rob Willekers

Advanced wavefront engineering for improved imaging and overlay applications on a 1.35 NA immersion scanner

Frank Staals, Jo Finders, Alena Andryzhyieuskaya, 2011, Advanced Lithography.

Aerial image measurement methods for fast aberration set-up and illumination pupil verification

Rob Willekers, Richard Pongers, Henk van Greevenbroek, 2001, SPIE Advanced Lithography.

First results from the Large Dynamic Range Atomic Force Microscope for overlay metrology

Stefan Kuiper, Rob Willekers, Gert Witvoet, 2019, Advanced Lithography.

Application of the aberration ring test (ARTEMIS) to determine lens quality and predict its lithographic performance

Rob Willekers, Wim de Boeij, Kevin D. Cummings, 2001, SPIE Advanced Lithography.

The status and future of imaging metrology needs for lithography

Rob Willekers, Joost Sytsma, Hans Van Der Laan, 2001 .

Tool-to-tool optical proximity effect matching

Geert Vandenberghe, Jeroen Van de Kerkhove, Guido Schiffelers, 2008, SPIE Advanced Lithography.