Peter Engblom

Advanced wavefront engineering for improved imaging and overlay applications on a 1.35 NA immersion scanner

Frank Staals, Jo Finders, Alena Andryzhyieuskaya, 2011, Advanced Lithography.

Process transfer strategies between ASML immersion scanners

Anton Devilliers, Eric Janda, Yuan He, 2009, Advanced Lithography.

Simulation-based pattern matching using scanner metrology and design data to reduce reliance on CD metrology

Anton Devilliers, Junwei Lu, Xu Xie, 2010, Advanced Lithography.

Improving aberration control with application specific optimization using computational lithography

Peng Liu, Yuan He, Peter Engblom, 2010, Advanced Lithography.

A study on the automation of scanner matching

Yuan He, Alexander Serebryakov, Peter Engblom, 2013, Advanced Lithography.