Yoko Matsumoto

发表

Enhancing the Novolak resin resist resolution by adding phenol to fractionated resin

Atsushi Sekiguchi, Toshiyuki Horiuchi, Yoko Matsumoto, 2016, SPIE Advanced Lithography.

Nanoimprint lithography using disposable biomass template

Atsushi Sekiguchi, Yoko Matsumoto, Satoshi Takei, 2016, SPIE Advanced Lithography.

Study of outgassing from the ArF CA chemically amplified resist ArF (193 nm) exposure

Atsushi Sekiguchi, Yoko Matsumoto, Hiroko Minami, 2019, Advanced Lithography.

Study of Dill's B parameter measurement of EUV resist

Atsushi Sekiguchi, Takeo Watanabe, Yoko Matsumoto, 2015, Advanced Lithography.

Study of acid diffusion behaves form PAG by using top coat method

Atsushi Sekiguchi, Yoko Matsumoto, 2014, Advanced Lithography.

Nanoimprint lithography using gas permeable template II

Atsushi Sekiguchi, Yoko Matsumoto, Satoshi Takei, 2018, Advanced Lithography.

A study on enhancing EUV resist sensitivity (2)

Atsushi Sekiguchi, Takeo Watanabe, Yoko Matsumoto, 2018, Advanced Lithography.

Study of the anti-fouling polymer sheet which used biomimetics technique

Atsushi Sekiguchi, Yoko Matsumoto, Hiroko Minami, 2018, NanoScience + Engineering.

Development of a new neutron time-of-flight spin interferometer

Yoko Matsumoto, Norio Achiwa, T. Ebisawa, 1997 .

Analysis of acid-generating action of PAG in an EUV resist using acid-sensitive dyes

John J. Biafore, Atsushi Sekiguchi, Yoko Matsumoto, 2013, Advanced Lithography.

Measurement of acid diffusion from PAG in photoresists by using TOF-SIMS with GCIB

Atsushi Sekiguchi, Yoko Matsumoto, Naoki Man, 2015, Advanced Lithography.

A study on enhancing EUV resist sensitivity (2)

Atsushi Sekiguchi, Takeo Watanabe, Yoko Matsumoto, 2017, Photomask Technology.

Analysis of the generating action of the acid from PAG using acid sensitive dyes

Yoko Matsumoto, Atsushi Sekiguchi, Kengo Moriyasu, 2011, Advanced Lithography.

Toward Chemotherapy on the Basis of Biomimetic Chemistry

Yoko Matsumoto, 2002 .

Effects of phenolic compound addition to fractionated Novolak-based resists to improve resolution capability(2)

Yoko Matsumoto, Hatsuyuki Tanaka, Yoshihisa Sensu, 2017, Advanced Lithography.

Nanoimprint lithography using gas permeable template

Atsushi Sekiguchi, Yoko Matsumoto, Satoshi Takei, 2017, Advanced Lithography.

In-situ measurement of outgassing generated from EUV resist including metal oxide nanoparticles during electron irradiation

Atsushi Sekiguchi, Takeo Watanabe, Yoko Matsumoto, 2017, Advanced Lithography.

High resolution patterning of ultraviolet cross-linked resins using gas permeable mold derived from cellulose in nanoimprint lithography

Atsushi Sekiguchi, Yoko Matsumoto, Satoshi Takei, 2017, NanoScience + Engineering.

Development of Nanoimprint Lithography Template Materials using Biomass

Atsushi Sekiguchi, Yoko Matsumoto, Satoshi Takei, 2016 .

Direct and instantaneous observation of intravenously injected substances using intravital confocal micro-videography

Yu Matsumoto, Yoko Matsumoto, Yuichi Yamasaki, 2010, Biomedical optics express.

Study of the Antifouling Polymer Sheet which used Biomimetics Technique

Atsushi Sekiguchi, Yoko Matsumoto, Hiroko Minami, 2018, Journal of Photopolymer Science and Technology.

Gas‐Permeable Cellulose Template for Reduction of Template Damage and Gas Trapping in Microimprint Lithography of High Volume Manufacturing

Atsushi Sekiguchi, Yoko Matsumoto, Satoshi Takei, 2016 .

Analysis of the Generating Action of the Acid from PAG using Acid Sensitive Dyes (2)

Atsushi Sekiguchi, Yoko Matsumoto, Kengo Moriyasu, 2012 .

Evaluation of Curing Characteristics in UV-NIL Resist

Atsushi Sekiguchi, Yoko Matsumoto, Yoshihiko Hirai, 2010 .