Makoto Hanabata

发表

Enhancing the Novolak resin resist resolution by adding phenol to fractionated resin

Atsushi Sekiguchi, Toshiyuki Horiuchi, Yoko Matsumoto, 2016, SPIE Advanced Lithography.

Chemically amplified i-line positive resist for next-generation flat panel display

Makoto Hanabata, Hsing-Chieh Lee, Ying-Hao Lu, 2017, Advanced Lithography.

Nanoimprint lithography using disposable biomass template

Atsushi Sekiguchi, Yoko Matsumoto, Satoshi Takei, 2016, SPIE Advanced Lithography.

Nanoimprint lithography for green water-repellent film derived from biomass with high-light transparency

Satoshi Takei, Makoto Hanabata, 2015, Advanced Lithography.

Approach of UV nanoimprint lithography using template with gas-permeable and gaseous adsorption for reduction of air-trapping issue

Satoshi Takei, Makoto Hanabata, Naoto Sugino, 2016, Photomask Technology.

Planarizing material for reverse-tone step and flash imprint lithography

Ryan Deschner, C. Grant Willson, Satoshi Takei, 2014 .

Utilization of gas permeable metal plate for the purpose of reduction of transfer defect in MEMS electronic device

Satoshi Takei, Makoto Hanabata, Naoto Sugino, 2018, Remote Sensing.

Gas permeable template derived from cellulose in ultraviolet nanoimprint

Satoshi Takei, Makoto Hanabata, Shinya Nakajima, 2018, Advanced Lithography.

Internal structure of metal material with gas permeability function related to MEMS devices

Satoshi Takei, Makoto Hanabata, Naoto Sugino, 2018, Remote Sensing.

Nanoimprint lithography using gas permeable template II

Atsushi Sekiguchi, Yoko Matsumoto, Satoshi Takei, 2018, Advanced Lithography.

Planarizing material for reverse-tone step and flash imprint lithography

Ryan Deschner, C. Grant Willson, Satoshi Takei, 2010, Advanced Lithography.

Development of spin-on hard mask materials under resist in nano imprint lithography

Ryan Deschner, C. Grant Willson, Satoshi Takei, 2010, Advanced Lithography.

Novolak Design For High Resolution Positive Photoresists(II): Stone Wall Model For Positive Photoresist Development

Makoto Hanabata, Akihiro Furuta, Yasunori Uetani, 1988, Advanced Lithography.

Study of lithographic characteristics due to differences in novolac resin structure

Atsushi Sekiguchi, Hatsuyuki Tanaka, Makoto Hanabata, 2020, Advanced Lithography.

Organic-inorganic hybrid materials for nanoimprint lithography

Makoto Hanabata, Junko Katayama, Shigeru Yamaki, 2006, SPIE Advanced Lithography.

EB and EUV lithography using inedible cellulose-based biomass resist material

Takahiro Kozawa, Seiichi Tagawa, Akihiro Oshima, 2016, SPIE Advanced Lithography.

High-sensitivity green resist material with organic solvent-free spin-coating and tetramethylammonium hydroxide-free water-developable processes for EB and EUV lithography

Takahiro Kozawa, Seiichi Tagawa, Akihiro Oshima, 2015, Advanced Lithography.

Evaluation of the properties of the permeability film material using cellulose nanofibers

Satoshi Takei, Makoto Hanabata, Naoto Sugino, 2016, Photomask Technology.

Temperature dependency of mechanical properties for crystalline cellulose added to silicone elastomer

Satoshi Takei, Makoto Hanabata, Naoto Sugino, 2017, NanoScience + Engineering.

Organic-inorganic hybrid resist materials in advanced lithography

Satoshi Takei, Makoto Hanabata, Naoto Sugino, 2017, NanoScience + Engineering.

Gas permeable mold for defect reduction in nanoimprint lithography

Satoshi Takei, Makoto Hanabata, Kento Mizui, 2019, Advanced Lithography.

Effects of phenolic compound addition to fractionated Novolak-based resists to improve resolution capability(2)

Yoko Matsumoto, Hatsuyuki Tanaka, Yoshihisa Sensu, 2017, Advanced Lithography.

Nanoimprint lithography using gas permeable template

Atsushi Sekiguchi, Yoko Matsumoto, Satoshi Takei, 2017, Advanced Lithography.

Temperature dependence of viscoelasticity of crystalline cellulose with different molecular weights added to silicone elastomer

Satoshi Takei, Makoto Hanabata, Naoto Sugino, 2017, NanoScience + Engineering.

Approach of pullulan derivatives to resist polymers for green lithography in eco-friendly optical NEMS and MEMS

Takahiro Kozawa, Seiichi Tagawa, Akihiro Oshima, 2014, Photonics Europe.

High resolution patterning of ultraviolet cross-linked resins using gas permeable mold derived from cellulose in nanoimprint lithography

Atsushi Sekiguchi, Yoko Matsumoto, Satoshi Takei, 2017, NanoScience + Engineering.

Novolac-based resists

Makoto Hanabata, 1994 .

Green Lithography Using Water-Developable Sugar-Based Negative Resist Materials

Takao Kameda, Satoshi Takei, Makoto Hanabata, 2016 .

Development of Nanoimprint Lithography Template Materials using Biomass

Atsushi Sekiguchi, Yoko Matsumoto, Satoshi Takei, 2016 .

Silicon-Containing Spin-on Underlayer Material for Step and Flash Nanoimprint Lithography

Ryan Deschner, C. Grant Willson, Satoshi Takei, 2010 .

Application of natural linear polysaccharide to green resist polymers for electron beam and extreme-ultraviolet lithography

Takahiro Kozawa, Seiichi Tagawa, Akihiro Oshima, 2014 .

Advanced step and flash nanoimprint lithography using UV-sensitive hard mask underlayer material

Ryan Deschner, Satoshi Takei, Makoto Hanabata, 2010 .

High-resolution nanopatterning of biodegradable polylactide by thermal nanoimprint lithography using gas permeable mold

Satoshi Takei, Makoto Hanabata, M. Hanabata, 2017 .

Inedible cellulose-based biomass resist material amenable to water-based processing for use in electron beam lithography

Satoshi Takei, Makoto Hanabata, Kigen Sugahara, 2015 .

Gas‐Permeable Cellulose Template for Reduction of Template Damage and Gas Trapping in Microimprint Lithography of High Volume Manufacturing

Atsushi Sekiguchi, Yoko Matsumoto, Satoshi Takei, 2016 .

Sub-70 nm resolution patterning of high etch-resistant epoxy novolac resins using gas permeable templates in ultraviolet nanoimprint lithography

Satoshi Takei, Makoto Hanabata, M. Hanabata, 2016 .

Novolak design concept for high performance positive photoresists

Makoto Hanabata, Akihiro Furuta, M. Hanabata, 1992 .

Ecofriendly ethanol-developable processes for electron beam lithography using positive-tone dextrin resist material

Takahiro Kozawa, Seiichi Tagawa, Akihiro Oshima, 2017 .

Characterization of Gas Permeable Template Material for Nanoimprinting

Takao Kameda, Atsushi Sekiguchi, Satoshi Takei, 2017 .

Ultraviolet nanoimprint lithography using cyclodextrin-based porous template for pattern failure reduction

Satoshi Takei, Makoto Hanabata, M. Hanabata, 2015 .

Design concept for a high‐performance positive photoresist

Makoto Hanabata, Akihiro Furuta, Yasunori Uetani, 1989 .

Eco-friendly, water-repellent, light-transparent film derived from psicose using nanoimprint lithography

Satoshi Takei, Makoto Hanabata, M. Hanabata, 2015 .