S. Derrough

Low voltage resist processes developed for MAPPER tool first exposures

L. Pain, B. Icard, D. Rio, 2010, European Mask and Lithography Conference.

Post-lithography characterization of ArF resists for 45 nm node implant layers and beyond

J. Foucher, A. Pikon, S. Derrough, 2008, SPIE Advanced Lithography.

Ellipsometry studies of the kinetic of deprotection of thin 193 nm positive tone resist film

C. Sourd, A. Pikon, S. Derrough, 2008, SPIE Advanced Lithography.

Mechanisms involved in HBr and Ar cure plasma treatments applied to 193 nm photoresists

A. Bazin, Olivier Joubert, E. Pargon, 2009 .