Hubert Schulz

NIL template manufacturing using a variable shaped e-beam writer and a new pCAR

Holger Sailer, Joerg Butschke, Mathias Irmscher, 2006, SPIE Advanced Lithography.

Low-temperature wafer-scale warm embossing for mix and match with UV lithography

Gabi Gruetzner, Hella-Christin Scheer, Matthias Wissen, 2002, SPIE Advanced Lithography.

Noncontact fluorescence measurements for inspection and imprint depth control in nanoimprint lithography

Hella-Christin Scheer, Karl Pfeiffer, Hubert Schulz, 2002, European Mask and Lithography Conference.

Template manufacturing for nanoimprint lithography using existing infrastructure

Holger Sailer, Joerg Butschke, Mathias Irmscher, 2005, SPIE Photomask Technology.

Performance of 4-in. wafer-scale thermoset working stamps in hot-embossing lithography

Hella-Christin Scheer, Frank Osenberg, Nils Roos, 2002, SPIE Advanced Lithography.

Mix and match of nanoimprint and UV lithography

Gabi Gruetzner, Hella-Christin Scheer, Karl Pfeiffer, 2001, SPIE Advanced Lithography.