Tetsuya Tatsumi

Dry etching resistance of methacrylate polymers for ArF excimer laser lithography

Takeshi Ohfuji, Masayuki Endo, Makoto Takahashi, 1998, Advanced Lithography.

Effect of transient behavior of pulse modulated inductively coupled plasma on photon-induced interface defects

Masaru Hori, Makoto Sekine, Kenji Ishikawa, 2015 .

Control of surface reactions in high-performance SiO2 etching

Miyako Matsui, Makoto Sekine, Tetsuya Tatsumi, 2000 .

Hydrogen effects in hydrofluorocarbon plasma etching of silicon nitride: Beam study with CF+, CF2+, CHF2+, and CH2F+ ions

Satoshi Hamaguchi, Tetsuya Tatsumi, Masanaga Fukasawa, 2011 .

Relationship of etch reaction and reactive species flux in C4F8/Ar/O2 plasma for SiO2 selective etching over Si and Si3N4

Miyako Matsui, Makoto Sekine, Tetsuya Tatsumi, 2001 .

Prediction of Fluctuations in Plasma–Wall Interactions Using an Equipment Engineering System

Atsushi Kawashima, Yasuhito Tanaka, Tetsuya Tatsumi, 2009 .

Reducing Damage to Si Substrates during Gate Etching Processes

Satoshi Hamaguchi, Tetsuya Tatsumi, Yukihiro Kamide, 2008 .