Stephen Hsu

发表

Precision process calibration and CD predictions for low-k1 lithography

Sangbong Park, Ting Chen, Gabriel Berger, 2005, Photomask Japan.

A new source optimization approach for 2X node logic

Peter De Bisschop, Bart Laenens, Stephen Hsu, 2011, Photomask Technology.

Complex 2D pattern lithography at λ/4 resolution using chromeless phase lithography (CPL)

John S. Petersen, Stephen Hsu, Robert J. Socha, 2002, SPIE Advanced Lithography.

Feasibility study of double exposure lithography for 65nm and 45nm node

Stephen Hsu, Jungchul Park, Douglas Van Den Broeke, 2005, Photomask Japan.

Dark field Double Dipole Lithography (DDL) for 45nm node and beyond

Jungchul Park, Stephen Hsu, J. Fung Chen, 2006, Photomask Japan.

Model-based scattering bars implementation for 65nm and 45nm nodes using IML technology

Stephen Hsu, Robert Socha, Michael Hsu, 2005, Photomask Japan.

RET masks for patterning 45nm node contact hole using ArF immersion lithography

Jason Shieh, Stephen Hsu, J. Fung Chen, 2006, Photomask Japan.

Freeform mask optimization using advanced image based M3D inverse lithography and 3D-NAND full chip OPC application

Gang Xu, Stephen Hsu, Jun He, 2018, Advanced Lithography.

Full-chip source and mask optimization

Hong Chen, Wei Yuan, Yen-Wen Lu, 2011, Advanced Lithography.

"Smart" source, mask, and target co-optimization to improve design related lithographically weak spots

Ki-Ho Baik, Xiaofeng Liu, Stephen Hsu, 2014, Advanced Lithography.

Patterning half-wavelength DRAM cell using chromeless phase lithography (CPL)

Stephen Hsu, J. Fung Chen, Douglas J. Van Den Broeke, 2002, SPIE Advanced Lithography.

Double dipole lithography for 65-nm node and beyond: defect sensitivity characterization and reticle inspection

Stephen Hsu, J. Fung Chen, Michael Hsu, 2004, SPIE Photomask Technology.

Implementation of random contact hole design with CPL mask by using IML technology

Linda Yu, Stephen Hsu, J. Fung Chen, 2005, SPIE Photomask Technology.

Manufacturing implementation of 32nm SRAM using ArF immersion with RET

Cheng-Han Wu, Stephen Hsu, Michael Hsu, 2008, SPIE Advanced Lithography.

Extending KrF to 100-nm imaging with high-NA- and chromeless phase lithography technology

Will Conley, John S. Petersen, Donis G. Flagello, 2002, SPIE Advanced Lithography.

RET masks for the final frontier of optical lithography

Jungchul Park, Sangbong Park, Ting Chen, 2005, Photomask Japan.

Manufacturing implementation of IML technology for 45 nm node contact masks

Stephen Hsu, J. Fung Chen, Michael Hsu, 2006, Photomask Japan.

Patterning 45nm flash/DRAM contact hole mask with hyper-NA immersion lithography and optimized illumination

Jo Finders, Sangbong Park, Ting Chen, 2006, SPIE Advanced Lithography.

Resist model calibration using 2D developed patterns for low-k1 process optimization and wafer printing predictions

Ting Chen, Linda Yu, Stephen Hsu, 2004, SPIE Photomask Technology.

Immersive remote monitoring of urban sites

Supun Samarasekera, Harpreet S. Sawhney, Stephen Hsu, 2002, SPIE Defense + Commercial Sensing.

Litho scenario solutions for FinFET SRAM 22nm node

Tsann-Bim Chiou, Alek C. Chen, Jo Finders, 2009, Lithography Asia.

Chromeless phase lithography reticle defect inspection challenges and solutions

Larry S. Zurbrick, Anthony Vacca, Stephen Hsu, 2004, SPIE Photomask Technology.

High NA EUV lithography: Next step in EUV imaging

Timon Fliervoet, Jan van Schoot, Stephen Hsu, 2019, Advanced Lithography.

Reticle defect printability for sub-0.3k1 chromeless phase lithography (CPL) technology

Stephen Hsu, J. Fung Chen, Douglas J. Van Den Broeke, 2002, Photomask Japan.

Impact of bandwidth variation on OPC model accuracy

Qian Zhao, Stephen Hsu, Paolo Alagna, 2016, Advanced Lithography.

Impact of attenuated PSM repair for 130-nm polygate lithography process

Will Conley, David Wang, Henry Lin, 2001, SPIE Advanced Lithography.

Experimental verification of source-mask optimization and freeform illumination for 22-nm node static random access memory cells

Geert Vandenberghe, Jens Timo Neumann, Mircea Dusa, 2011 .

Tuning MEEF for CD control at 65nm node based on Chromeless Phase Lithography (CPL)

Stephen Hsu, J. Fung Chen, Douglas J. Van Den Broeke, 2002, Photomask Technology.

High-resolution actinic imaging and phase metrology of 193-nm CPL reticles

Stephen Hsu, J. Fung Chen, Bryan Kasprowicz, 2004, SPIE Photomask Technology.

Full-chip manufacturing reliability check and correction (MRC2): a first step toward design for manufacturability with low k1 lithography

Stephen Hsu, J. Fung Chen, Michael Hsu, 2004, SPIE Photomask Technology.

The impact of illumination on feature fidelity for CPL mask technology

Will Conley, Chris Progler, Stephen Hsu, 2004, SPIE Advanced Lithography.

Double exposure technique for 45nm node and beyond

Jungchul Park, Stephen Hsu, J. Fung Chen, 2005, SPIE Photomask Technology.

A holistic methodology to drive process window entitlement and its application to 20nm logic

Gary Zhang, Pengcheng Li, Ayman Hamouda, 2015, Advanced Lithography.

Process results using automatic pitch decomposition and double patterning technology (DPT) at k1eff <0.20

Anton van Oosten, Stephen Hsu, Judy Huckabay, 2006, SPIE Photomask Technology.

Lithography manufacturing implementation for 65 nm and 45 nm nodes with model-based scattering bars using IML technology

Stephen Hsu, Robert Socha, Michael Hsu, 2004, SPIE Advanced Lithography.

OPC model calibration for CPL patterning at extreme low k1

Linda Yu, Stephen Hsu, J. Fung Chen, 2004, SPIE Photomask Technology.

Development of layout split algorithms and printability evaluation for double patterning technology

Tsann-Bim Chiou, Alek C. Chen, Anton van Oosten, 2008, SPIE Advanced Lithography.

EUV source-mask optimization for 7nm node and beyond

Paul van Adrichem, Thijs Hollink, Stephen Hsu, 2014, Advanced Lithography.

Quantification of two-dimensional structures generalized for OPC model verification

Stephen Hsu, J. Fung Chen, Michael Hsu, 2007, SPIE Advanced Lithography.

Layer aware source mask target optimization

Xiaoyang Li, Stephen Hsu, Ao Chen, 2016, Advanced Lithography.

SMO for 28-nm logic device and beyond: impact of source and mask complexity on lithography performance

Wei Liu, Hong Chen, Hiroshi Yamazaki, 2010, Advanced Lithography.

Dual damascene photo process using negative-tone resist

Will Conley, Stephen Hsu, Robert J. Socha, 2000, Advanced Lithography.

Performance of a programmable illuminator for generation of freeform sources on high NA immersion systems

Markus Degünther, Oscar Noordman, Stephen Hsu, 2009, Lithography Asia.

A single-exposure approach for patterning 45nm flash/DRAM contact hole mask

Jo Finders, Sangbong Park, Edita Tejnil, 2006, Photomask Japan.

Characterization and optimization of overlay target design for shallow-trench isolation (STI) process

Stephen Hsu, Daniel R. Busath, Jason K. Saw, 1999, Advanced Lithography.

Resist profile aware source mask optimization

Michael Hsieh, Mu Feng, Stephen Hsu, 2014, Advanced Lithography.

Efficient full-chip SRAF placement using machine learning for best accuracy and improved consistency

Quan Zhang, Yu Cao, Yen-Wen Lu, 2018, Advanced Lithography.

Contact and via hole mask design optimization for 65-nm technology node

Stephen Hsu, Robert Socha, J. Fung Chen, 2004, SPIE Photomask Technology.

Freeform source optimization for improving litho-performance of warm spots

Chun-Wei Wu, Chiang-Lin Shih, Stephen Hsu, 2011, Photomask Technology.

Design intent optimization at the beyond 7nm node: the intersection of DTCO and EUVL stochastic mitigation techniques

Lars W. Liebmann, Nicole Saulnier, Derren Dunn, 2017, Advanced Lithography.

Phase defect repair for the chromeless phase lithography (CPL) mask

Stephen Hsu, J. Fung Chen, Douglas J. Van Den Broeke, 2002, Photomask Technology.

Design compliant source mask optimization (SMO)

Robert John Socha, Tejas Jhaveri, Xiaofeng Liu, 2010, Photomask Japan.

Application challenges with double patterning technology (DPT) beyond 45 nm

Vincent Wiaux, Geert Vandenberghe, Jo Finders, 2006, SPIE Photomask Technology.

Mask design optimization for 70-nm technology node using chromeless phase lithography (CPL) based on 100% transmission phase-shifting mask

Stephen Hsu, J. Fung Chen, Douglas J. Van Den Broeke, 2002, Photomask Japan.

OPC resist model separability validation after SMO source change

Jeroen Van de Kerkhove, Peter De Bisschop, Werner Gillijns, 2013, Advanced Lithography.

Mesa or Trench Type for Chromeless Phase-shift Lithography From Photolithographic Performance Point of View

Stephen Hsu, J. Fung Chen, Robert J. Socha, 2002, Photomask Technology.

Trench warfare!: fitting photons for fine-feature fabrication

Will Conley, Stephen Hsu, Robert J. Socha, 2001, SPIE Advanced Lithography.

Patterning optimization for 55nm design rule DRAM/flash memory using production-ready customized illuminations

Sangbong Park, Ting Chen, Gabriel Berger, 2005, SPIE Photomask Technology.

Optimizations aspects for EUV low-k1 logic with the low-n mask

Jo Finders, Stephen Hsu, M.-Claire van Lare, 2021, Photomask Technology.

Full chip computational lithography for KrF multi-focal imaging (MFI) (Conference Presentation)

Will Conley, Stephen Hsu, Michael Crouse, 2021 .