Doug van den Broeke

Precision process calibration and CD predictions for low-k1 lithography

Sangbong Park, Ting Chen, Gabriel Berger, 2005, Photomask Japan.

Applications of CPL mask technology for sub-65nm gate imaging

Will Conley, Jonathan Cobb, Doug van den Broeke, 2004, SPIE Advanced Lithography.

Compensating mask topography effects in CPL through-pitch solutions toward the 45nm node

Geert Vandenberghe, Wolfgang Degel, Vicky Philipsen, 2005, SPIE Photomask Technology.

The impact of illumination on feature fidelity for CPL mask technology

Will Conley, Chris Progler, Stephen Hsu, 2004, SPIE Advanced Lithography.