A. Skumanich

In-tool process control for advanced patterning based on integrated metrology and tool-level data stream analysis

J. Yamartino, David Mui, A. Skumanich, 2004, ASMC 2004.

Methodology for defect impact studies under conditions of low electrical testing coverage

E. Ryabova, A. Skumanich, 2002, Proceedings of the 2002 International Conference on Microelectronic Test Structures, 2002. ICMTS 2002..

Use of test structures for Cu interconnect process development and yield enhancement

Man-Ping Cai, A. Skumanich, J. Educato, 2000, ICMTS 2000. Proceedings of the 2000 International Conference on Microelectronic Test Structures (Cat. No.00CH37095).

Methodology for targeted defect reduction and inspection optimization

E. Ryabova, A. Skumanich, 2002, 13th Annual IEEE/SEMI Advanced Semiconductor Manufacturing Conference. Advancing the Science and Technology of Semiconductor Manufacturing. ASMC 2002 (Cat. No.02CH37259).

Methodology for yield analysis based on targeted defect impact studies

E. Ryabova, A. Skumanich, 2001, 2001 IEEE International Symposium on Semiconductor Manufacturing. ISSM 2001. Conference Proceedings (Cat. No.01CH37203).

In-line SEM based ADC for advanced process control

D. Farrington, A. Skumanich, B. Halliday, 2000, 2000 IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop. ASMC 2000 (Cat. No.00CH37072).

A comparison of inspection strategy models for optimized tool utilization

A. Skumanich, 2000, 2000 IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop. ASMC 2000 (Cat. No.00CH37072).